Fig. 1From: A Novel Nanofabrication Technique of Silicon-Based NanostructuresSchematics of the process for fabricating SiO2 nanostructures. a E-beam lithography. b α-Si mask is opened using the resist mask by RIE. c SiO2 nanofeatures are produced by RIE. d α-Si mask is selectively removed using wet etch in TMAH solution to form final SiO2 nanostructuresBack to article page