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Table 1 Device parameters for ETSOI PMOSFETs with Hf-Ti-O as gate dielectric

From: Electrical Properties of Ultrathin Hf-Ti-O Higher k Gate Dielectric Films and Their Application in ETSOI MOSFET

Parameters

PMOSFET (W/L = 0.5 μm/25 nm)

PMOSFET (W/L = 3 μm/40 nm)

I on (μA/μm)

246

453

I off (A/μm)

2.2 × 10−9

2.9 × 10−9

I on/I off

1.12 × 105

1.56 × 105

V tsat (V)

−0.28

−0.22

V tlin (V)

−0.35

−0.27

g m (μS/μm)

522

856

DIBL (mV/V)

82

59

SS (mV/decade)

70

66

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