Fig. 8From: CMOS-Compatible Fabrication for Photonic Crystal-Based Nanofluidic StructureSEM pictures of dose-related PC grating structures, six different e-beam lithography doses were used for fabrication. a PMMA gratings patterned by e-beam lithography. b Cr gratings with patterned PMMA as photoresist. c Si3N4 gratings as guided mode layer for PC, and etched with Cr as hard maskBack to article page