Fig. 3From: On-Demand Fabrication of Si/SiO2 Nanowire Arrays by Nanosphere Lithography and Subsequent Thermal OxidationReduction of the PS particle diameter vs etching time. PS spheres with various initial sphere diameter D 0 (1039, 483, 315 nm) were treated with rf plasma at flow rates of 16.5 sccm Ar. The symbols are the experimental data and the solid curves is obtained from Eq. 1 Back to article page