Fig. 1From: Silicon Nanostructures Produced by Modified MacEtch Method for Antireflective Si SurfaceSchematic view of the SiNW formation on Si substrate by the modified Au-MacEtch process, which is divided in three steps: a thermal vacuum deposition of Au thin film on Si substrate; b thermal annealing of gold-coated Si substrate for the coagulation of deposited Au thin film into nanodrops; c etching of the prepared samples in HF/H2O2/H2O solutionBack to article page