Fig. 5From: Silicon Nanostructures Produced by Modified MacEtch Method for Antireflective Si SurfaceSEM images of SiNWs formed from close-packed Au nanodrops (a), and SiNPs formed from non-close-packed Au nanodrops (b) after 30 min of etching of Si substrates in HF/H2O2/H2O solutionBack to article page