Fig. 4From: Plasma-Assisted Atomic Layer Deposition of High-Density Ni Nanoparticles for Amorphous In-Ga-Zn-O Thin Film Transistor Memory a SEM images of ALD Ni NPs on the Al2O3 film at 280 °C for different deposition cycles. b The histograms of size distribution of the corresponding Ni NPs, fitted by Gaussian functionBack to article page