Account

Table 1 The parameters of the samples versus deposition conditions

From: Effect of Ge Content on the Formation of Ge Nanoclusters in Magnetron-Sputtered GeZrO_x-Based Structures

RFP_Ge, W/cm²	Ellipsometry data		RBS data^a
RFP_Ge, W/cm²	n @ 632.8 nm	Ge, at.%	Ge, at%	Zr, at %	O, at%	Si, at%	Density, at/cm²
0	1.970	0	0	26.5	67.0	6.0	1.35E + 18
0.7	1.749	~17	15.0	17.5	62.9	4.0	1.43E + 18
0.9	2.000	~21	(22.0)	(16.0)	(57.0)	(3.0)	-
1.1	2.641	~30	30.0	14.0	52.0	3.0	1.20E + 18
1.3	2.730	~32	(33.0)	(13.0)	(50.0)	(3.0)	-
1.6	2.983	~40	42.0	10.5	43.9	2.5	1.17E + 18
2.2	3.167	~47	53.0	8.0	35.9	2.0	1.09E + 18

^aNote. The content of the elements placed in the parentheses was obtained by the extrapolation of RBS data

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