Fig. 2From: Au Gratings Fabricated by Interference Lithography for Experimental Study of Localized and Propagating Surface PlasmonsAFM cross-sections of Au gratings with a period of 296.6 ± 0.5 nm, modulation depth of 13.0 ± 3 nm (a), 20 ± 3 nm (b), 29.0 ± 3 nm (c), and 35.0 ± 3 nm (d), after additional deposition of 10 nm of Au (e) and 20 nm of Au (f)Back to article page