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Fig. 2 | Nanoscale Research Letters

Fig. 2

From: Enhanced Dielectric Environment Sensitivity of Surface Plasmon-Polariton in the Surface-Barrier Heterostructures Based on Corrugated Thin Metal Films with Quasi-Anticorrelated Interfaces

Fig. 2

a Schematic cross section of heterostructure with quasi-anticorrelated interfaces of the metal film, where 1 semiconductor substrate; 2 bottom metal film with thickness h Au 1; 3 chalcogenide nanowires with width of basis, d; 3 metal top film with thickness h Au 2; and 4 ohmic contact. L is the structures period, and h is the grating depth. b SEM image of heterostructure surface fabricated by presented method based on the photoresistive laser interference lithography

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