Fig. 3From: Epitaxial Growth of SrTiO3 Films on Cube-Textured Cu-Clad Substrates by PLD at Low Temperature Under Reducing AtmosphereFWHM of (200) RD and TD of ω-scans and (111) ϕ-scans for the (100) STO films deposited between 300 and 650 °C at laser frequency and chamber pressure of 10 Hz and 4 × 10−4 mbar, respectivelyBack to article page