Table 1 Photoelectrochemical characterization of M/TiO2 films (M–Co, Ni, Mn, Cu)
Sample | Efb (eV) vs NHE | Quantum yield of photocurrent η (a.u.) | Eg (eV) | E1/2 (V) |
---|---|---|---|---|
TiO2 | −0.42 | 1 | 3.09 | −0.58 |
1% Ni/TiO2 | −0.42 | 1.66 | 3.07 | −0.46 |
5% Ni/TiO2 | −0.45 | 1.14 | 2.95 | −0.76 |
1% Co/TiO2 | −0.36 | 1.07 | 3.07 | −0.52 |
5% Co/TiO2 | −0.80 | 0.28 | 2.97 | −0.67 |
1% Mn/TiO2 | −0.48 | 2.80 | 3.08 | −0.52 |
5% Mn/TiO2 | −0.40 | 0.93 | 2.88 | −0.6 |
1% Cu/TiO2 | −0.30 | 1.03 | 3.08 | −0.55 |
5% Cu/TiO2 | −0.15 | 1.14 | 3.07 | −0.78 |
30% Cu/TiO2 | −0.10 | 0.94 | 2.99 |