Fig. 3From: Absorption Amelioration of Amorphous Si Film by Introducing Metal Silicide NanoparticlesRaman spectra of a NiSi/Si film and b AlSi/Si film before and after annealing in vacuum at 400, 500, and 600 °C, and the absorption coefficient of c NiSi/Si films and d AlSi/Si films annealed at different temperaturesBack to article page