Fig. 5From: Absorption Amelioration of Amorphous Si Film by Introducing Metal Silicide NanoparticlesThe cross-sectional TEM images of a NiSi/Si (NS-1) and b AlSi/Si (AS-1) films annealed at 500 °C and high-resolution images of a 1 NiSi/Si (NS-1) and b 1 AlSi/Si (AS-1) films derived from the areas marked with red rectangles in Fig. 5a, b Back to article page