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Table 1 The structures and annealing temperatures of samples S1–S3

From: The Study of Electrical Properties for Multilayer La2O3/Al2O3 Dielectric Stacks and LaAlO3 Dielectric Film Deposited by ALD

Sample Film structures Annealing temperature
S1 2 × (20-cycle Al2O3 + 20-cycle La2O3) 600 °C
S2 2 × (20-cycle Al2O3 + 20-cycle La2O3) 800 °C
S3 40 × (1-cycle Al2O3 + 1-cycle La2O3) 600 °C