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Table 1 The structures and annealing temperatures of samples S1–S3

From: The Study of Electrical Properties for Multilayer La₂O₃/Al₂O₃ Dielectric Stacks and LaAlO₃ Dielectric Film Deposited by ALD

Sample	Film structures	Annealing temperature
S1	2 × (20-cycle Al₂O₃ + 20-cycle La₂O₃)	600 °C
S2	2 × (20-cycle Al₂O₃ + 20-cycle La₂O₃)	800 °C
S3	40 × (1-cycle Al₂O₃ + 1-cycle La₂O₃)	600 °C

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