Fig. 3From: Paramagnetic Intrinsic Defects in Polycrystalline Large-Area 2D MoS2 Films Grown on SiO2 by Mo Sulfurization g map of the LM1 defect in MoS2 sample 4MLa inferred from K-band ESR measurements at 4.2 K for B (at angle φB with n) rotating in the Si substrate (0‾11) plane. The solid curve represents an optimized fitting of expression g(φB) = [g // 2cos2(φB) + g ⊥ 2sin2(φB)]½ for a center of axial (C3v) symmetry giving g // = 2.00145 and g ⊥ = 2.0027Back to article page