Table 1 The RMS roughness of BP samples before and after PEALD at different temperatures
From: Direct Growth of Al2O3 on Black Phosphorus by Plasma-Enhanced Atomic Layer Deposition
Temperature (°C) | The average roughness (before/after) (nm) | Standard deviation (before/after) (nm) |
|---|---|---|
150 | 8.33/1.20 | 0.46/0.76 |
200 | 6.13/2.52 | 0.16/1.80 |
250 | 7.55/1.66 | 0.71/0.24 |
300 | 7.95/3.56 | 3.34/2.73 |
350 | 11.05/2.63 | 7.10/1.44 |