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Table 1 The RMS roughness of BP samples before and after PEALD at different temperatures

From: Direct Growth of Al2O3 on Black Phosphorus by Plasma-Enhanced Atomic Layer Deposition

Temperature (°C) The average roughness (before/after) (nm) Standard deviation (before/after) (nm)
150 8.33/1.20 0.46/0.76
200 6.13/2.52 0.16/1.80
250 7.55/1.66 0.71/0.24
300 7.95/3.56 3.34/2.73
350 11.05/2.63 7.10/1.44