Fig. 1From: Structural Properties Characterized by the Film Thickness and Annealing Temperature for La2O3 Films Grown by Atomic Layer DepositionGIXRD diffractograms of as-grown and annealed La2O3 films deposited on Si substrate. a 10 and b 20 nm La2O3 films. Hexagonal La2O3 and hexagonal La(OH)3 patterns are added for comparisonBack to article page