Fig. 3From: Structural Properties Characterized by the Film Thickness and Annealing Temperature for La2O3 Films Grown by Atomic Layer DepositionBandgaps for the La2O3 films with different thickness and annealing temperatures. a as-grown 10 and b 10 nm La2O3 annealed at 600 °C, and c as-grown 20 and d 20 nm La2O3 annealed at 600 °CBack to article page