Fig. 5From: Electronic Structure and Charge-Trapping Characteristics of the Al2O3-TiAlO-SiO2 Gate Stack for Nonvolatile Memory Applications(Color online) XPS spectra of Ti 2p3/2 states from the TiO2/Al2O3/Si (a) and TiAlO/SiO2/Si (b) structure. c Room-temperature PL spectra from Al2O3/TiAlO/SiO2 structure. d A schematic diagram of the defect levels and PL processes in TiAlO filmBack to article page