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Fig. 7 | Nanoscale Research Letters

Fig. 7

From: Self-templated Synthesis of Nickel Silicate Hydroxide/Reduced Graphene Oxide Composite Hollow Microspheres as Highly Stable Supercapacitor Electrode Material

Fig. 7

a CV curves of Ni3Si2O5(OH)4/RGO hollow microspheres (black curve), bare Ni3Si2O5(OH)4 hollow microspheres (red curve), and bare RGO material (blue curve) tested at the scanning rate of 20 mV s–1 in 2 M KOH. b CV curves of Ni3Si2O5(OH)4/RGO hollow microspheres tested at a series of different sweeping rates. c GCD curves of Ni3Si2O5(OH)4/RGO hollow microspheres (black curve), bare Ni3Si2O5(OH)4/RGO microspheres (red curve) and bare RGO material (blue curve) at the current density of 1 A g–1. d GCD curves of Ni3Si2O5(OH)4/RGO hollow microspheres measured at a set of varied current densities. e Specific capacitance of Ni3Si2O5(OH)4/RGO hollow microsphere electrode deduced from the GCD curves depicted in d as a function of current density. f Nyquist plots of Ni3Si2O5(OH)4/RGO hollow microsphere (black curve) and bare Ni3Si2O5(OH)4 hollow microsphere (red curve) electrodes

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