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Table 1 Details of the HfO2 thin films

From: Surface Passivation of Silicon Using HfO2 Thin Films Deposited by Remote Plasma Atomic Layer Deposition System

Sample

O2 plasma pretreatment

Annealing temperature(°C)

SD

N/A

N/A

SD-A400

N/A

400

SD-A450

N/A

450

SD-A500

N/A

500

SD-A550

N/A

550

SD-A600

N/A

600

SD-A650

N/A

650

SO

Yes

N/A

SO-A400

Yes

400

SO-A450

Yes

450

SO-A500

Yes

500

SO-A550

Yes

550

SO-A600

Yes

600

SO-A650

Yes

650

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