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Table 1 RTA vs. conventional hydrogen gas annealing

From: Enhanced Photoelectrochemical Behavior of H-TiO2 Nanorods Hydrogenated by Controlled and Local Rapid Thermal Annealing

Hydrogenation methods

Conventional hydrogen gas annealing

RTA

Chamber

Small sized samples

Hot wall

High energy consumption

Small and large scaled samples (<4”)

Cool wall

Low energy consumption

→ Local heating and soft treatment

Ramping/cooling time

~ Several hours

~ Several seconds or minutes

Holding time

~0.5-1 h

~1 h

Sheet resistance of FTO

Increased with increased annealing temperatures

Unchanged with increased annealing temperatures

Achieved photocurrent density (mA/cm2) at 0.23 V versus Ag/AgCl

2.5 (Ref.4)

2.9 (Ref.15)

3.7 (This work)

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