Fig. 2From: Effect of Systematic Control of Pd Thickness and Annealing Temperature on the Fabrication and Evolution of Palladium Nanostructures on Si (111) via the Solid State DewettingHeight in a–e and diameter in a-1–e-1 distribution histograms of Pd NPs with 3 to 15 nm deposition amount annealed at 575 °C for 450 s. f–h Summary of average height (AH), average width (AW), and average density (AD) with respect to the deposition amount. Error bars for the AH, AW, and AD are ±5% in f, g, and h. i, j. Summary plots of RMS roughness (Rq) and surface area ratio (SAR)Back to article page