Fig. 2From: Compliance-Free ZrO2/ZrO2 − x /ZrO2 Resistive Memory with Controllable Interfacial Multistate Switching BehaviourXPS spectra of a Zr 3d and b O 1s for the ZrO2/ZrO2 − x /ZrO2 tri-layer structure over an etch time of 700 s. c XPS depth profile of the ZrO2/ZrO2 − x /ZrO2 tri-layer structureBack to article page