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Fig. 2 | Nanoscale Research Letters

Fig. 2

From: Unraveling the Morphological Evolution and Etching Kinetics of Porous Silicon Nanowires During Metal-Assisted Chemical Etching

Fig. 2

Fabricated SiNWs using a Ag deposition solution containing 0.005 M AgNO3 and 4.8 M HF and an etchant solution composed of 48 M H2O and 0.95 HF–H2O2 molar ratio. SEM images of the SiNWs for Ag deposition times of a 30 s and b 4 min. c Etch rate of the SiNWs for different Ag deposition times. TEM images of the middle section of the SiNWs for Ag deposition times of d 4, e 10, and f 15 showing the degree of porosity. Etch duration for all samples was 30 min

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