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Fig. 5 | Nanoscale Research Letters

Fig. 5

From: Batch Fabrication of Broadband Metallic Planar Microlenses and Their Arrays Combining Nanosphere Self-Assembly with Conventional Photolithography

Fig. 5

a Optical field mappings of the 4 μm microlens for the simulated cases of a1 λ = 633 nm, P = 522 nm; a2 λ = 532 nm, P = 522 nm; a3 λ = 532 nm, P = 900 nm; and a4 the measured result of λ = 532 nm, P = 900 nm. b The axial light intensity of the calculated R-S integral, FDTD simulation, and optical measurement for the designed microlens of d = 4 μm. c The field intensity difference for the c1 simulated and c2 measured results when d = 8 μm at λ = 532 nm, P = 900 nm. d The axial intensity for the microlens of d = 8 μm. The intensity fields along the y-z planes are identically distributed as x-z planes

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