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Table 2 Optically determined values of carrier concentration and mobility for each analyzed GaN layer of the investigated n+/n0/n+-GaN structure

From: Infrared Reflectance Analysis of Epitaxial n-Type Doped GaN Layers Grown on Sapphire

Layer no.

N × 1017 (cm−1)

μ (cm2V−1s−1)

1

28.8 (±0.13)

133.3 (±1.20)

2

0.37 (±0.01)

300.0 (±0.90)

3

34.4 (±0.12)

119.7 (±0.75)

4

2.04 (±0.03)

187.4 (±0.67)

5

22.20 (±0.07)

121.9 (±0.52)

Template

0.31 (±0.01)

259.4 (±1.27)

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