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Table 1 Reflectance maximum (R-max) and minimum (R-min) of the Si wafer and SiNWs in the UV, visible, and IR regions

From: Optical and Electrical Characteristics of Silicon Nanowires Prepared by Electroless Etching

Sample

UV region (200–400 nm)

Visible region (400–750 nm)

IR region (750–1000 nm)

R-max (%)

R-min (%)

R-max (%)

R-min (%)

R-max (%)

R-min (%)

Si substrate

65.1

38.8

38.8

25.5

25.5

22.1

SiNWs

19.2

3.5

15.1

12.1

12.1

9.8

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