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Fig. 4 | Nanoscale Research Letters

Fig. 4

From: Conduction Mechanism and Improved Endurance in HfO2-Based RRAM with Nitridation Treatment

Fig. 4

a Analysis current conduction mechanism of HRS from I-V curves in HfO2-based RRAM between initial and after nitridation treatment. b The Poole-Frenkel current conduction mechanism of HRS in HfO2-based RRAM. c The Schottky emission current conduction mechanism of HRS in HfO2-based RRAM after the nitridation treatment. d Analysis current conduction mechanism of LRS which transforms to SCLC from ohmic conduction after nitridation treatment in HfO2-based RRAM; the inset figure shows the SCLC current fitting result. e The Ohmic conduction mechanism of LRS in HfO2-based RRAM which is characteristic in current negative correlation with temperature. f The SCLC mechanism of LRS in HfO2-based RRAM that is independent on temperature after the nitridation treatment

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