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Correction to: Charge Splitting In Situ Recorder (CSIR) for Real-Time Examination of Plasma Charging Effect in FinFET BEOL Processes

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The original article was published in Nanoscale Research Letters 2017 12:534


In the original publication [1] Fig. 3 was presented incorrect. The correct additional file has been included with this erratum and the original article has been updated to rectify this error.

Fig. 3

a The plasma charging effect for the different metal layers varies on different locations across the wafer. b The positive and negative charges may compensate each other in the stacked metal layers


  1. 1.

    Tsai Y-P (2017) Charge splitting in situ recorder (CSIR) for real-time examination of plasma charging effect in FinFET BEOL processes. Nanoscale Res Lett 12:534 doi:10.1186/s11671-017-2309-0

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Correspondence to Yi-Pei Tsai.

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