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Table 1 The Elemental Percentages of In2O3 Films Deposited at Different Temperatures

From: Atomic-Layer-Deposition of Indium Oxide Nano-films for Thin-Film Transistors

Deposition Temperature

C

In

O

Atomic Ratio of In:O

160 °C

6.9%

42.9%

50.2%

1:1.17

180 °C

1.1%

42.3%

56.5%

1:1.34

200 °C

0

42.3%

57.7%

1:1.36

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