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Table 1 The Elemental Percentages of In2O3 Films Deposited at Different Temperatures

From: Atomic-Layer-Deposition of Indium Oxide Nano-films for Thin-Film Transistors

Deposition Temperature C In O Atomic Ratio of In:O
160 °C 6.9% 42.9% 50.2% 1:1.17
180 °C 1.1% 42.3% 56.5% 1:1.34
200 °C 0 42.3% 57.7% 1:1.36