Table 1 The Elemental Percentages of In2O3 Films Deposited at Different Temperatures
From: Atomic-Layer-Deposition of Indium Oxide Nano-films for Thin-Film Transistors
Deposition Temperature | C | In | O | Atomic Ratio of In:O |
---|---|---|---|---|
160 °C | 6.9% | 42.9% | 50.2% | 1:1.17 |
180 °C | 1.1% | 42.3% | 56.5% | 1:1.34 |
200 °C | 0 | 42.3% | 57.7% | 1:1.36 |