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Table 2 The on-current shift, off-current shift, and subthreshold voltage swing variance values of CL-ES-structured device and BCE-structured device

From: Enhancement of a-IGZO TFT Device Performance Using a Clean Interface Process via Etch-Stopper Nano-layers

BL

T

Bias time

CL-ES

BCE

Vg bias − 30 V

Vg bias − 30 V

Ion (uA)

Ioff (pA)

Vth (V)

SS (V/dec)

Ion (uA)

Ioff (pA)

Vth (V)

SS (V/dec)

0nit

RT

0 s

7.50

0.01

− 0.71

0.50

8.79

0.21

2.34

1.69

5000nit

60 °C

1000 s

7.92

0.12

− 1.06

0.50

11.83

0.57

0.02

1.85

5000nit

60 °C

3600 s

6.99

0.10

− 1.22

0.83

15.99

6.59

− 1.54

2.11

Shift (1 h–0 h)

− 0.51

0.09

− 0.51

0.33

7.20

6.38

− 3.88

0.42

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