Fig. 4From: Perpendicular Magnetic Anisotropy and Hydrogenation-Induced Magnetic Change of Ta/Pd/CoFeMnSi/MgO/Pd MultilayersThe out-of-plane M-H loops for Ta/Pd/CFMS (2.3 nm)/MgO (1.3 nm)/Pd films annealed at 300 °C. a Under H2 introduction. b Comparison after removing H2. c The dependence of Mr and Hk on H2 concentrationBack to article page