Fig. 8From: Reduced Contact Resistance Between Metal and n-Ge by Insertion of ZnO with Argon Plasma Treatmenta Rtot versus d curves for the CTLM with Al/2 nm ZnO /n−-Ge contacts with different Ar plasma treatment duration, inset in Fig. 5a is the information of CTLM structure used in this work. b ρc versus different Ar plasma treatment durationBack to article page