Table 1 The experimental design for studying the effects of composition, interface, and deposition sequence on electrical properties
ALD cycles | Composition (Ta2O5:Al2O3) | Interfaces (in film) | Deposition sequence (first layer) | |||
---|---|---|---|---|---|---|
Ta2O5 | Al2O3 | Major cycle | ||||
I | 86 | 0 | 10 | 1:0 | 0 | Ta2O5 |
72 | 12 | 10 | 38:12 | 20 | Ta2O5 | |
55 | 19 | 10 | 29:19 | 20 | Ta2O5 | |
50 | 23 | 10 | 27:23 | 20 | Ta2O5 | |
44 | 26 | 10 | 23:26 | 20 | Ta2O5 | |
32 | 33 | 10 | 17:33 | 20 | Ta2O5 | |
0 | 54 | 10 | 0:1 | 0 | Al2O3 | |
II | 11 | 4 | 50 | 29:19 | 100 | Al2O3 |
23 | 8 | 25 | 29:19 | 50 | Al2O3 | |
43 | 15 | 13 | 29:19 | 26 | Al2O3 | |
55 | 19 | 10 | 29:19 | 20 | Al2O3 | |
63 | 22 | 9 | 29:19 | 18 | Al2O3 | |
80 | 28 | 7 | 29:19 | 14 | Al2O3 | |
III | 72 | 12 | 10 | 38:12 | 20 | Al2O3 |
72 | 12 | 10 | 38:12 | 20 | Ta2O5 |