Fig. 5From: Plasma-Enhanced Atomic Layer Deposition of Cobalt Films Using Co(EtCp)2 as a Metal PrecursorAFM images of the Co films (1200 cycles) deposited with Co(EtCp)2 pulse time of 2 s and NH3 plasma pulse time of 10 s at different temperatures: a 100 °C; b 150 °C; c 200 °C; d 250 °CBack to article page