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Fig. 9 | Nanoscale Research Letters

Fig. 9

From: Nanofabrication of High-Resolution Periodic Structures with a Gap Size Below 100 nm by Two-Photon Polymerization

Fig. 9

SEM images of 2PP fabricated periodic structure with PD=200 nm. Material: E-shell 300. Intensity used for the fabrication of grating lines: I=0.83 kW/ μm2; pillars: I=0.6 kW/ μm2. The relative laser focus distance for fabrication of grating lines and pillars is 300 nm. ab Periodic structures fabricated with laser focus position setting inside the photoresist. cd SEM images of periodic structures with proper laser focus position. e Top view of the structure fabricated with proper laser focus position. f SEM image of the whole array

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