Fig. 3From: Improved Ferroelectric Performance of Mg-Doped LiNbO3 Films by an Ideal Atomic Layer Deposited Al2O3 Tunnel Switch Layera, b Isw-t dependences in type I under different V applied to the Al2O3/LN bilayer with the Al2O3 thickness d = 0 and 6 nm, respectively, fitted by a series of parallel dotted lines to Eq. (1). c The plateaus of domain switching current as a function of the applied voltage with different Al2O3 layer thicknesses, where the solid lines show the best fit of the data to Eq. (2). d The Al2O3-layer-thickness d dependence of the coercive voltage (Vc) extracted from c. e, f The extracted interfacial capacitance Ci and contact resistance RC as functions of the Al2O3 layer thickness dBack to article page