Fig. 5From: Structure and Dielectric Property of High-k ZrO2 Films Grown by Atomic Layer Deposition Using Tetrakis(Dimethylamido)Zirconium and OzoneThe full spectrum scan of XPS (a), the fine spectra of O 1 s (b), and Zr 3d (c) for ZrO2 film deposited on Si(100) at 250 °C, and the fine spectra of Zr 3d for ZrO2 films deposited at 150, 250, and 350 °C (d)Back to article page