Fig. 5From: Wafer-Scale Fabrication of Sub-10 nm TiO2-Ga2O3 n-p Heterojunctions with Efficient Photocatalytic Activity by Atomic Layer DepositionNyquist plots of the 2D TiO2, Ga2O3, and TiO2-Ga2O3 heterostructures tested in air at a temperature of 25 °CBack to article page