Correction to: Nanoscale Res Lett
https://doi.org/10.1186/s11671-019-2991-1
Please be advised that the name of one of the coauthors in the original article [1] has been incorrectly spelled: ‘Ranish M. Ramachandran’ should be ‘Ranjith K. Ramachandran’.
The authors apologize for this error.
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Xu et al (2019) Wafer-Scale Fabrication of Sub-10 nm TiO2-Ga2O3 n-p Heterojunctions with Efficient Photocatalytic Activity by Atomic Layer Deposition. Nanoscale Res Lett 14:163. https://doi.org/10.1186/s11671-019-2991-1
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The original article can be found online at https://doi.org/10.1186/s11671-019-2991-1
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Xu, H., Han, F., Xia, C. et al. Correction to: Wafer-Scale Fabrication of Sub-10 nm TiO2-Ga2O3 n-p Heterojunctions with Efficient Photocatalytic Activity by Atomic Layer Deposition. Nanoscale Res Lett 14, 173 (2019). https://doi.org/10.1186/s11671-019-3028-5
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DOI: https://doi.org/10.1186/s11671-019-3028-5