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Fig. 40 | Nanoscale Research Letters

Fig. 40

From: Carbon Nanotube Assembly and Integration for Applications

Fig. 40

a Schematic of fabrication process for patterned CNTFET networks. b Optical microscope image of patterned electrode substrates after self-assembled colloidal mask assembly. c SEM image of interconnected nanotube ring patterns formed during the self-assembly process and gate voltage-dependent I-V characteristics of resulting CNTFET. The center to center distance of the circles is around 500 nm. (Inset) shows the corresponding magnified view of the interconnected nanotube ring patterns. [Y. Chen and C. Papadopoulos, unpublished results]

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