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Table 1 Device parameters following ITRS and IRDS requirement

From: High-Performance Two-Dimensional InSe Field-Effect Transistors with Novel Sandwiched Ohmic Contact for Sub-10 nm Nodes: a Theoretical Study

Channel length

EOT (nm)

VDS (V)

Node

7 nm

0.5

0.68

2019

5 nm

0.41

0.64

2021

3 nm

0.41

0.64

2024

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