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Fig. 4 | Nanoscale Research Letters

Fig. 4

From: Plasma-Enhanced Chemical Vapor Deposition of Acetylene on Codeposited Bimetal Catalysts Increasing Graphene Sheet Continuity Under Low-Temperature Growth Conditions

Fig. 4

Raman maps of graphene grown on 50 nm codeposited Ni-Au with 30s C2H2 exposure time via a CVD, b ICPCVD with 5 W plasma, and c ICPCVD with 10 W plasma. The I2D:G, ID:G, and FWHM2D for each plasma power are shown in d where it is apparent that 10 W serves as the best due to its higher I2D:G, lower ID:G, and smaller FWHM2D compared to the others, and a representative spectra taken from the brightest region of c is shown in e

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