Table 2 Description of surface chemical treatments and metal layers deposited on GaAs (110) substrates for GIXRD analysis
Sample# | Oxide removal | Surface passivation | Metal layers |
|---|---|---|---|
S1 | HCl:H2O | – | Ti (20 nm) |
S2 | HCl:H2O | (NH4)2Sx | Ti (20 nm) |
S3 | HCl:H2O | (NH4)2Sx | Pt (5 nm) |
S4 | HCl:H2O | (NH4)2Sx | Pt/Ti (5/20 nm) |