A Monoclinic V1-x-yTixRuyO2 Thin Film with Enhanced Thermal-Sensitive Performance

Table 2 TCR, RT resistivity, and processing temperature of V_0.8163Ti_0.165Ru_0.0187O₂ and other vanadium oxide-based thermal-sensitive thin films previously reported

Material	−TCR (%/°C)	Resistivity (Ω·cm)	Processing temperature (°C)	References
VO_x	~ 2.7	2	No heating	[45]
Mo-doped VO_x	4.0–4.5	> 1000	300	3
Mo-doped VO_x	2.5	0.3	No heating	[45]
Nb-doped VO_x	2.1	0.5	No heating	[45]
Ti-doped VO_x	2.5	~ 360	370	[46]
Ta-doped VO_x	3.47	9.32	400	[47]
V_0.8163Ti_0.165Ru_0.0187O₂	3.47	1.55	400	This work