Fig. 4From: Variation on the Microstructure and Mechanical Properties of Ti-Al-N Films Induced by RF-ICP Ion Source Enhanced Reactive Nitrogen Plasma Atmospherea RMS roughness values of Ti–Al–N films as a function of nitrogen gas flow rates. Insert table is the values of Al/Ti rations; b and c are the AFM images of S3 and S5 samples, respectivelyBack to article page