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Table 2 Comparative study of conventional doping with electrical doping

From: Electrically Doped Nanoscale Devices Using First-Principle Approach: A Comprehensive Survey

Various doped materials features

Conventional doping

Electrical doping

Chlorine-doped WS2-metal interface [131]

Co-doped ZnO structures joining the Al electrode [132]

Doped armchair graphene nanoribbons [133]

Carbon nanotubes with boron/nitrogen co-doping [52]

Electrically doped pin FET from adenine-based single-wall nanotube [55]

Electrically doped gated diode from single-wall thymine nanotube-like structure [70]

GaAs pin nanodiode [75]

Electrically doped nanobiopin FET [76]

Maximum current achieved

Data not given

− 4862 nA

6.16 × 10−6 A

Data not given

15.9 µA

99.3 µA

1.16 µA

35.96 nA

Composite central region length

5 × 5 WS2 super-cell (inorganic, metal interface)

Inorganic (ZnO)

Organic (graphene nanoribbon)

Organic (carbon nanotube)

Biomolecular, 3.35 nm

Biomolecular, 3.75 nm

Inorganic (GaAs), electrode is 1 nm with a cross section of 0.5 nm × 0.5 nm

Biomolecular, 6.24 nm

Operating temperature

Room temperature

Room temperature

Room temperature

Room temperature

300 K

300 K

300 K

300 K

Force tolerance

0.001 eV/Å

0.05 eV/Å

NM

0.01 eV/ºA

0.01 eV/Å

0.01 eV/Å

0.05 eV/Å

0.05 eV/Å

Applied bias (V)

− 1 to + 1

Low

0.02

0.0025–0.5

 ± 0.01

 ± 0.01

Doping concentration

2% of total sulfur atoms

2.5% of total Zn atoms

Satisfactory

B/N pairs: 5% and 10%, respectively

3.05 × 1018/cm3

5.73 × 1018/cm3

5.23 × 1019/cm3

4 × 1019/cm3

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