Fig. 1From: ZrOx Negative Capacitance Field-Effect Transistor with Sub-60 Subthreshold Swing Behaviora Key process steps for the fabrication of the Al2O3/5 nm HfO2 NCFETs and 4.2 nm ZrOx NCFETs. b Schematics and c HRTEM images of the fabricated ZrOx NCFETs. d Schematics and e HRTEM images of the fabricated Al2O3/HfO2 NCFETsBack to article page